产品列表
- 贵金属
- Iron & Iron Alloy Target
- 镍靶及镍合金溅射靶
- Copper & Copper Alloy Target
- Vanadium & Vanadium Alloy Target
- Titanium & Titanium Alloy Target
- Chromium & Chromium Alloy Target
- Aluminum & Aluminum Alloy Target
- Cobalt & Cobalt Alloy Target
- Tantalum & Tantalum Alloy Target
- Niobium & Niobium Alloy Target
- Tin & Tin Alloy Target
- Indium & Indium Alloy Target
- Evaporation Materials
- Ceramic Sputtering Targets
- Ceramic Evaporation Materials
Cobalt Nickel Iron Manganese (CoNiFeMn) Sputtering Target
| 材料类型 | CoNiFeMn Target |
|---|---|
| 元素符号 | CoNiFeMn |
| 原子量 | 3N |
| 原子序数 | As request |
| 颜色/外形 | Planar |
| 热导率 | 1-3week W/m.K |
| 熔点 | Support Customize (°C) |
| 沸点 | Support (°C) |
| 热膨胀系数 | Semiconductors, display panels, optics, solar energy, and functional coatings /K |
产品简介
Cobalt Nickel Iron Manganese (CoNiFeMn) Sputtering Target Description:
Co-Ni-Fe-Mn (Co-Ni-Fe-Mn) is typically not used as a traditional ternary or quaternary alloy target,
but rather as a core component of high-entropy alloys (HEAs). When combined with elements such as chromium (Cr),
it forms materials with extremely superior properties.
Common ratio:
CoFeTaB 53/23/8/16at% (customization available)
High purity (≥99.9%)
Excellent corrosion and oxidation resistance
High temperature resistance, maintaining structural stability above 600°C
Applications:
Precision instruments and magnetic recording;
Aerospace;
Energy and chemical industries;
Magnetic sensors
Preparation process: The preparation of high-entropy alloy targets is challenging, typically employing vacuum melting or
powder metallurgy processes to ensure precise composition control and uniform microstructure.
Related Sputtering Targets
CoCr sputtering target
CoCrNi sputtering target
CoFeB sputtering target
CoCu sputtering target
